 Focused ion beam (FIB) microscopy is a unique interactive tool for the in-situ, site-specific nanomachining and microstructural analysis of nanostructures. There is dramatic growth in FIB activity in areas such as direct device processing, 3D micromachining, nanopatterning, biological and nanomaterials analysis.
This one-day meeting is aimed at both current and future FIB users, covering the latest exciting FIB developments in the areas of nanoprocessing and nanoanalysis techniques, and state-of-the-art FIB instrumental development. Important topics will be highlighted in keynote presentations,
Abstracts for short oral and poster contributions (200 words in length) are invited, including in the FIB technology areas of:
• Semiconductor devices and failure analysis
• Novel 3D micromachining applications and tool manufacture
• Nanopatterning and nanocircuits
• Biological applications of FIB
• Specimen preparation methods for nanoanalysis
• Instrumentation development
This meeting precedes the MSMXVI Conference, which is taking place over four days at Keble College, Oxford. To see the details of the conference please click here.
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